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Home -> Products -> Wafer Inspection Systems -> Wafer Inspection System MX51
Wafer Inspection Systems:
Introduction
Wafer Inspection System MX61A
Wafer Inspection System MX61 & MX61L
Wafer Inspection System MX51
Wafer Inspection Systems AL110 Autoloaders
Wafer Inspection System MX51
The Olympus MX51 Effect: 
More Efficient Inspections Throughout Industry.
The Olympus MX51 industrial inspection microscope is optimized for the inspection requirements of a variety of electronic components including semiconductor wafer inspection. Its compact size, ease of operation, 6"x6" stage travel and cost effectiveness make the MX51 an ideal inspection microscope offering superb operational versatility.
Features & Benefits Accessories Specifications Brochures Peripherals
Specifications
Optical
system		UIS (Universal Infinity System)
Microscope
stand		2-guide rack and pinion method
Coarse and fine co-axial Z-axis control stroke 32mm (2mm upper and 30mm below from the focal plane)
The same stroke 15mm (combination with transmitted illumination)
Stroke per rotation of coarse Z-axis control 0.1mm (1 unit 1um)
Coarse handle torque adjustment
Coarse handle upper limit lever
Illumination
TypeBX-KMA Brightfield illuminator             BX-RLA2 Brightfield/Darkfield illuminator
BX-URA2 Universal fluorescence illuminator                
Contrast
changeover
method

-

BF-DF slide methodMirror
(Max. up to 6) turret method
Applicable
observation
method		1)Brightfield
2)Nomarski DIC
3)Polarized light

1)Brightfield
2)Darkfield
3)Nomarski DIC
4)Polarized light
5)IR		1)Brightfield
2)Darkfield
3)Nomarski DIC
4)Polarized light
5)Fluorescence
Lamphouseing6V30W Halogen
Lamp socket: U-LS30-4
Transfomer: TL-4		12V100W Halogen
Lamphouse: U-LH100L-3
Power supply is integrated in MX51		Mercury lamp house:
U-LH100HGAPO
External power supply: BH2-RFL-T3 needed
Transmitted
illumination		Brightfield MX-TILLK combined with fiber light guide illumination (configured with MX-SIC6R2)
Observation
tube		1)U-BI30-2 Widefield binocular, 2)U-TR30-2 Widefield trinocular, 3)U-ETR3 Widefield erect image trinocular (F.N.22)
4)U-SWTR Superwidefield trinocular, 5)MX-SWETTR Superwidefield erect image tilting trinocular (F.N.26.5)
Revolving
nosepiece		1)U-5RE-2, 2)U-6RE
3)U-D5BDRE, 4)U-D6BDRE, 5)U-P5BDRE (with slider slot for DIC Prism)
Stage
U-SIC4R2/SIC4L2 Coaxial right/left hand control 4"x4’ stageMX-SIC6R2 Coaxial right hand control 6"x6"                
Drive method: rack & pinion method
Y axis stopper: lever method		Drive method: Belt method
Stroke: 158(X)x158(Y)mm
Clutch method: 2 clutch plates (Built-in clutch ON/OFF handle)
Holder dimensions: 200x200mm
Transmitted light area: 100x100mm
Dimensions/
weight		Dimensions: Approx. 430(W)x591(D)x495(H)mm
Weight: Approx. 26kg (Stand Approx. 11kg)
Electric
system		100-120/220-240V, 1.8/0.8A, 50/60Hz

For your Industrial Micro-Imaging requirements in North America, please call our Customer Sevices Team to arrange an on-site demonstration, ask for more information at: 866-629-2450 (toll free), or complete the
on-line inquiry form.
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