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The Olympus MX51 Effect:
More Efficient Inspections Throughout Industry.
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The Olympus MX51 industrial inspection microscope is optimized for the inspection requirements of a variety of electronic components including semiconductor wafer inspection. Its compact size, ease of operation, 6"x6" stage travel and cost effectiveness make the MX51 an ideal inspection microscope offering superb operational versatility.
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 | The combination of a transmitted illumination unit with the 150mm stage enables transmitted light brightfield observation of samples up to 2mm thick, with an illumination range 100x100mm. |  | Use of the AL110-6 series wafer loaders, which accept wafers up to 150mm, offers front- and back-macro inspection and microscope inspection without the operator handling the wafers. | 
 | The standard illuminator (BX-RLA2) complies with near IR observation, as well as offering brightfield, darkfield, Nomarski DIC and simple polarizing observations. |  | The confocal module (U-CFU) employs an original disk scanning method to deliver high-contrast, high-resolution observation images. This allows inspection of multi-layered electronic devices. |  | A wide range of Olympus digital cameras can be added to the MX51. Additionally, adapters allows the use of digital or video cameras currently in use. |
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For your Industrial Micro-Imaging requirements in North America, please call our Customer Sevices Team to arrange an on-site demonstration, ask for more information at: 866-629-2450 (toll free), or complete the
on-line inquiry form.
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